Local 1176
Usagers :
Saman Choubak (saman.choubak@polymtl.ca)
Responsable:
Pierre Lévesque (p.levesque@umontreal.ca)
Description
Procédures
XPS Argon Sputtering Gun - Procedure">XPS Argon Sputtering Gun - Procedure
Procedure to sputter the surface of the sample in the XPS-LEEM chamber with the Argon Sputtering Gun:
1) Make sure the X-ray source is fully retracted.
2) Put the sample in place and check all the pressures.
3) Close the ion pump gate valve.
4) Close completly the turbo pump gate valve, then open it (hear the click) and do a turn (the value should be 1/6 open).
5) Check the pressure of the Ar and make sure the Ar switch is on.
6) Bridge the interlock on the Rack.
7) Slowly open the Ar valve (Monitor the chamber pressure while opening the valve).
8) Stop opening the Ar valve once the chamber pressure reaches 6x10-6 or 1x10-5 mbar.
9) Switch on the IQE11-A source and switch Operate, slowly increase the energy monitoring the chamber pressure. Leave it @ 1.01 keV.
10) Allow 30 min sputtering.
11) On the IQE-11-A, turn the energy knob to zero and go to stand by.
12) Close the Ar valve.
13) Open the turbo pump gate valve.
14) Once the chamber pressure reaches low 10-8 mbar, open the ion pump valve.