Historique de la page

{bgcolor:#F9FBFE}

{color:#000080}{*}Local{*}{color} {color:#800000}{*}1176{*}{color}

{color:#000080}{*}Usagers :*{color}

{color:#800000}Saman Choubak (saman.choubak@polymtl.ca){color}

{color:#000080}{*}Responsable:*{color}

{color:#800000}Pierre Lévesque (p.levesque@umontreal.ca){color}

h3. Description
----
\\


h3. Procédures
----
h4. {color:#800000}XPS - Procedure{color}

{panel}
*Procedure to run the XPS:*

*1)\- Pumping the Water*

* *Make sure the the filters are clean (filters at the back and the front).*
* *Make sure the water is clean, if not change the water (fill 3/4 of the container with DI water and 1/4 of it with distilled water, add ions as necessary, one spoon is enough  for the start).*

*2) Turn On the XRC1000, the water light should be on.*

*3) Push the water switch on the XRC and run the water on the bottom of the rack (this should be on StandBye).*

*4) The water and the pump should start working. Monitor the flowrate, th e value should be equal or bigger than 3 l/min, the pressure value is around 7 bar.*

*5) Let the water run for a while and add ions if necessary.*

*6) In order to launch and run the X-ray, follow the procedure written on the XPS manual.*

*7) If the XPS has not been in function for a while, refer to the XPS manual intial setup procedure.*
{panel}

h4. {color:#800000}XPS Argon Sputtering Gun - Procedure{color}

{panel}
*Procedure to sputter the surface of the sample in the XPS-LEEM chamber with the Argon Sputtering Gun:*

*1) Make sure the X-ray source is fully retracted.*

*2) Put the sample in place and check all the pressures.*

*3) Close the ion pump gate valve.*

*4) Close completly the turbo pump gate valve, then open it (hear the click) and do a turn (the value should be 1/6 open).*

*5) Check the pressure of the Ar and make sure the Ar switch is on.*

*6) Bridge the interlock on the Rack.*

*7) Slowly open the Ar valve (Monitor the chamber pressure while opening the valve).*

*8) Stop opening the Ar valve once the chamber pressure reaches 6x10-6 or 1x10-5 mbar.*

*9) Switch on the IQE11-A source and switch Operate, slowly increase the energy monitoring the chamber pressure. Leave it @ 1.01 keV.*

*10) Allow 30 min sputtering.*

*11) On the IQE-11-A, turn the energy knob to zero and go to stand by.*

*12) Close the Ar valve.*

*13) Open the turbo pump gate valve.*

*14) Once the chamber pressure reaches low  10-8 mbar, open the ion pump valve.*
{panel}

h4. {color:#800000}Sample Annealing in the XPS Chamber - Procedure{color}

{panel}
*Procedure to anneal the sample in the XPS-LEEM chamber:*

*1) Turn on the primary pump.*

*2) Slowly increase the filament current (check the emission).*

*3) Once the filament start emiiting, go very slowly on the filament current and look at the sample.*

*4) Stop at desired sample temperature and anneal for 3-5 minutes (or desired time).*

*5) Slowly decrease the filament current.*

*6) Decrease the accelerating voltage to 0.*

*7) Once everything is 0, unplug the filament current \(+) or \(-) from the back.*

*8) Stop opening the Ar valve once the chamber pressure reaches 6x10-6 or 1x10-5 mbar.*

*9) Turn off the sample heater.*

*10) Plug back the wire.*
{panel}