{bgcolor:#F9FBFE}
{color:#000080}{*}Local{*}{color} {color:#800000}{*}1176{*}{color}
{color:#000080}{*}Usagers :*{color}
{color:#800000}Saman Choubak (saman.choubak@polymtl.ca){color}
{color:#000080}{*}Responsable:*{color}
{color:#800000}Pierre Lévesque (p.levesque@umontreal.ca){color}
h3. Description
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h3. Procédures
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h4. {color:#800000}XPS - Procedure{color}
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*Procedure to run the XPS:*
*1)\- Pumping the Water*
* *Make sure the the filters are clean (filters at the back and the front).*
* *Make sure the water is clean, if not change the water (fill 3/4 of the container with DI water and 1/4 of it with distilled water, add ions as necessary, one spoon is enough for the start).*
*2) Turn On the XRC1000, the water light should be on.*
*3) Push the water switch on the XRC and run the water on the bottom of the rack (this should be on StandBye).*
*4) The water and the pump should start working. Monitor the flowrate, th e value should be equal or bigger than 3 l/min, the pressure value is around 7 bar.*
*5) Let the water run for a while and add ions if necessary.*
*6) In order to launch and run the X-ray, follow the procedure written on the XPS manual.*
*7) If the XPS has not been in function for a while, refer to the XPS manual intial setup procedure.*
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h4. {color:#800000}XPS Argon Sputtering Gun - Procedure{color}
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*Procedure to sputter the surface of the sample in the XPS-LEEM chamber with the Argon Sputtering Gun:*
*1) Make sure the X-ray source is fully retracted.*
*2) Put the sample in place and check all the pressures.*
*3) Close the ion pump gate valve.*
*4) Close completly the turbo pump gate valve, then open it (hear the click) and do a turn (the value should be 1/6 open).*
*5) Check the pressure of the Ar and make sure the Ar switch is on.*
*6) Bridge the interlock on the Rack.*
*7) Slowly open the Ar valve (Monitor the chamber pressure while opening the valve).*
*8) Stop opening the Ar valve once the chamber pressure reaches 6x10* *^\-6{^}* *or 1x10* *^\-5{^}* *mbar.*
*9) Switch on the IQE11-A source and switch Operate, slowly increase the energy monitoring the chamber pressure. Leave it @ 1.01 keV.*
*10) Allow 30 min sputtering.*
*11) On the IQE-11-A, turn the energy knob to zero and go to stand by.*
*12) Close the Ar valve.*
*13) Open the turbo pump gate valve.*
*14) Once the chamber pressure reaches low 1010* *^\-8{^}* *mbar, open the ion pump valve.*
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h4. {color:#800000}Sample Annealing in the XPS Chamber - Procedure{color}
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*Procedure to anneal the sample in the XPS-LEEM chamber:*
*1) Turn on the primary pump.*
*2) Slowly increase the filament current (check the emission).*
*3) Once the filament start emiiting, go very slowly on the filament current and look at the sample.*
*4) Stop at desired sample temperature and anneal for 3-5 minutes (or desired time).*
*5) Slowly decrease the filament current.*
*6) Decrease the accelerating voltage to 0.*
*7) Once everything is 0, unplug the filament current \(+) or \(-) from the back.*
*8) Stop opening the Ar valve once the chamber pressure reaches 6x10* *^\-6{^}* *or 1x10* *^\-5{^}* *mbar.*
*9) Turn off the sample heater.*
*10) Plug back the wire.*
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