XPS-LEEM

Procedure to run the XPS:

1) Pumping the Water

• Make sure the the filters are clean (filters at the back and the front).
• Make sure the water is clean, if not change the water (fill 3/4 of the container with DI water and 1/4 of it with distilled water, add ions as necessary, one spoon is enough  for the start).

2) Turn On the XRC1000, the water light should be on.

3) Push the water switch on the XRC and run the water on the bottom of the rack (this should be on StandBye).

4) The water and the pump should start working. Monitor the flowrate, th e value should be equal or bigger than 3 l/min, the pressure value is around 7 bar.

5) Let the water run for a while and add ions if necessary.

6) In order to launch and run the X-ray, follow the procedure written on the XPS manual.

7) If the XPS has not been in function for a while, refer to the XPS manual intial setup procedure.

Procedure to sputter the surface of the sample in the XPS-LEEM chamber with the Argon Sputtering Gun:

1) Make sure the X-ray source is fully retracted.

2) Put the sample in place and check all the pressures.

3) Close the ion pump gate valve.

4) Close completly the turbo pump gate valve, then open it (hear the click) and do a turn (the value should be 1/6 open).

5) Check the pressure of the Ar and make sure the Ar switch is on.

6) Bridge the interlock on the Rack.

7) Slowly open the Ar valve (Monitor the chamber pressure while opening the valve).

8) Stop opening the Ar valve once the chamber pressure reaches 6x10 ^-6 or 1x10 ^-5 mbar.

9) Switch on the IQE11-A source and switch Operate, slowly increase the energy monitoring the chamber pressure. Leave it @ 1.01 keV.

10) Allow 30 min sputtering.

11) On the IQE-11-A, turn the energy knob to zero and go to stand by.

12) Close the Ar valve.

13) Open the turbo pump gate valve.

14) Once the chamber pressure reaches low 10 ^-8 mbar, open the ion pump valve.

Procedure to anneal the sample in the XPS-LEEM chamber:

1) Turn on the primary pump.

2) Slowly increase the filament current (check the emission).

3) Once the filament start emiiting, go very slowly on the filament current and look at the sample.

4) Stop at desired sample temperature and anneal for 3-5 minutes (or desired time).

5) Slowly decrease the filament current.

6) Decrease the accelerating voltage to 0.

7) Once everything is 0, unplug the filament current (+) or (-) from the back.

8) Stop opening the Ar valve once the chamber pressure reaches 6x10 ^-6 or 1x10 ^-5 mbar.

9) Turn off the sample heater.

10) Plug back the wire.